FLUORESCENT X-RAY APPARATUS FOR MEASURING FILM THICKNESS OF MINUTE PART

PURPOSE:To provide a fluorescent X-ray measuring device for measuring the film thickness of a minute part which casts X-ray beams of a small diameter and has a large casting intensity, by providing a sample observing mechanism equipped with a function to observe a sample at all times and capable of...

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1. Verfasser: NAITO MITSUO
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To provide a fluorescent X-ray measuring device for measuring the film thickness of a minute part which casts X-ray beams of a small diameter and has a large casting intensity, by providing a sample observing mechanism equipped with a function to observe a sample at all times and capable of shortening the distance between a collimator and the sample. CONSTITUTION:A mirror for registering a sample is arranged so that the sample can be observed while a shutter is closed. Moreover, the mirror is coupled with the shutter at a position upper than a collimator 6. A mirror 9b for observing the sample being measured is disposed in a manner to observe the sample while the shutter is opened. The mirror 9b is coupled to the shutter at a position upper than the collimator 6. Therefore, it is possible to switch the mirror for observing the sample in association with the opening/closing operation of the shutter. In this manner, the sample can be always observed irrespective of the state of the shutter whether it is opened or closed, and the distance between the collimator and the sample can be reduced. Accordingly, a fluorescent X-ray apparatus for measuring the film thickness of a minute part which invites less extension of the diameter of beams and has a large intensity to cast X rays is provided.