N,N-DISUBSTITUTED SULFONEAMIDE COMPOUND AND RADIATION-SENSITIVE MIXTURE PREPARED BY USING ITS COMPOUND

The invention relates to N,N-disubstituted sulphonamides of the formulae R [-N(CO-OR )-SO2R ]n and R [-SO2-N(CO-OR )-R ]n, in which R - in the case where n = 1 - is a (C1-C20)alkyl, (C3-C10)cycloalkyl, (C6-C14)aryl or (C7-C20)aralkyl radical and - in the case where n > 1 - is the divalent, trivalent or tetravalent radical of a (C1-C20)alkane or (C5-C7)cycloalkane, of an unfused or fused monocyclic or polycyclic (C6-C18)aromatic compound, R is a (C3-C11)alkyl, (C3-C11)alkenyl or (C7-C11)aralkyl radical, R is an unsubstituted or substituted (C1-C6)alkyl, (C3-C6)cycloalkyl, (C6-C14)aryl or (C7-C20 )aralkyl radical. In addition, the invention relates to a positive-working radiation-sensitive mixture containing a) a compound which forms an acid on exposure to actinic radiation, b) an acid-cleavable compound whose cleavage products have greater solubility in an aqueous-alkaline developer than does the starting compound, and c) a polymeric binder which is insoluble in water, but soluble, at least swellable, in aqueous-alkaline solutions, where compound b) is a sulphonamide of the formula I or II. The mixture according to the invention is particularly suitable for the production of offset printing plates and photoresists.