VAPOR DRYING DEVICE FOR SEMICONDUCTOR WAFER

PURPOSE:To improve the safety of a vapor drying by closing a shutter mechanism which isolates an organic solvent bath from the outside and supplying a fine extinguishing gas to the bath when a sensor detects the start of a fire in the bath. CONSTITUTION:When a flame sensor 30 and temperature sensor...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	TAJIMA TOMOHAYA, KAMIKAWA YUJI, MIYAZAKI TAKANORI, KOBAYASHI KAZUHIKO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HEATING LIGHTING MECHANICAL ENGINEERING SEMICONDUCTOR DEVICES WEAPONS
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Beschreibung
Zusammenfassung:	PURPOSE:To improve the safety of a vapor drying by closing a shutter mechanism which isolates an organic solvent bath from the outside and supplying a fine extinguishing gas to the bath when a sensor detects the start of a fire in the bath. CONSTITUTION:When a flame sensor 30 and temperature sensor 31 detect the start of a fire, a control unit 34 immediately stops a filter fan unit, moves back a wafer chuck, and closes side and front shutter which isolate an organic solvent tank 21 from the outside. The unit 34 then opens an auto-cover 32 which opens/closes the top of the bath 21. Thereafter, the unit 34 discontinues power supply and starts to discharge CO2 from a nozzle 30. Therefore, the safety of this vapor drying device is further improved.