POSITIVE TYPE RESIST COMPOSITION FOR BLACK MATRIX

PURPOSE:To obtain a resist compsn. excellent, in various properties such as fineness and heat resistance and giving a sufficiently high black density by incorporating an alkali-soluble resin, a quinonediazido compd., a black pigment and a solvent. CONSTITUTION:This positive type resist compsn. conta...

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Hauptverfasser: YAMAMOTO SHIGEKI, HISHIRO YOSHIKI, TAKEYAMA NAOMIKI
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To obtain a resist compsn. excellent, in various properties such as fineness and heat resistance and giving a sufficiently high black density by incorporating an alkali-soluble resin, a quinonediazido compd., a black pigment and a solvent. CONSTITUTION:This positive type resist compsn. contains an alkali-soluble resin, a quinonediazide compd., a black pigment and a solvent. The alkali-soluble resin is, e.g. novolak resin or a vinyl copolymer. The novolak resin is, e.g. novolak resin having about 1,000-50,000mol.wt. and contg. repeating units represented by the formula, wherein each of R1-R5 is H, a halogen, alkyl, alkenyl or acetyl and each of R6 and R7 is alkyl, benzyl or phenyl. The vinyl polymer is, e.g. polyvinyl phenol, hydrogenated polyvinyl phenol or a vinyl phenol copolymer.