POSITIVE TYPE RESIST COMPOSITION FOR BLACK MATRIX
PURPOSE:To obtain a resist compsn. excellent, in various properties such as fineness and heat resistance and giving a sufficiently high black density by incorporating an alkali-soluble resin, a quinonediazido compd., a black pigment and a solvent. CONSTITUTION:This positive type resist compsn. conta...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | PURPOSE:To obtain a resist compsn. excellent, in various properties such as fineness and heat resistance and giving a sufficiently high black density by incorporating an alkali-soluble resin, a quinonediazido compd., a black pigment and a solvent. CONSTITUTION:This positive type resist compsn. contains an alkali-soluble resin, a quinonediazide compd., a black pigment and a solvent. The alkali-soluble resin is, e.g. novolak resin or a vinyl copolymer. The novolak resin is, e.g. novolak resin having about 1,000-50,000mol.wt. and contg. repeating units represented by the formula, wherein each of R1-R5 is H, a halogen, alkyl, alkenyl or acetyl and each of R6 and R7 is alkyl, benzyl or phenyl. The vinyl polymer is, e.g. polyvinyl phenol, hydrogenated polyvinyl phenol or a vinyl phenol copolymer. |
---|