PLANAR MAGNETRON SPUTTER DEVICE

PURPOSE:To acquire a device which can improve use efficiency of a target greatly and form a transparent conductive thin film of good quality having high electric conduction by constituting a poloidal field generation means of a specific central magnet, outside magnet and auxiliary magnet. CONSTITUTI...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SUWA HIDENORI, TSUKAGOSHI OSAMU
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PURPOSE:To acquire a device which can improve use efficiency of a target greatly and form a transparent conductive thin film of good quality having high electric conduction by constituting a poloidal field generation means of a specific central magnet, outside magnet and auxiliary magnet. CONSTITUTION:A poloidal field generation means is provided with a long and slender central magnet 12 which is positioned along a longitudinal central axis of a target 17 and parallel therewith and a long annular outside magnet 13 which is provided to enclose a periphery of the central magnet 12 and has a polarity opposite to that of the central magnet 12. It is also provided with at least one of auxiliary magnets 14, 15 which are positioned between the central magnet 12 and the outside magnet 13 along the magnets 12, 13 and control a magnetic field so that distribution of a vertical magnetic field element in a surface parallel with the target 17 inside each cross section of a magnetic field formed near the target 17 passes through a zero level three times. The auxiliary magnet 14 arranged adjacent to the central magnet 12 is made to have a polarity which is opposite to that of the central magnet 12.