MANUFACTURE OF THIN FILM DEVICE

PURPOSE:To prevent the lowering of resistance of a signal line, and to form components of a part lower than the signal line securely. CONSTITUTION:A first transparent conductive film d1 made of transparent conductive film, a first conductive film g1 made of Cr film and a second conductive film g2 ma...

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Bibliographische Detailangaben
Hauptverfasser:	ORITSUKI RYOJI, MATSUMARU HARUO, SAKUTA HIROKI, HASHIMOTO YUICHI, HORII JUICHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	PURPOSE:To prevent the lowering of resistance of a signal line, and to form components of a part lower than the signal line securely. CONSTITUTION:A first transparent conductive film d1 made of transparent conductive film, a first conductive film g1 made of Cr film and a second conductive film g2 made of Al film are continuously provided by spattering. After the photographing, dry etching is performed to the second conductive film g2 selectively, and dry etching is performed to the first conductive film g1 selectively, and dry etching is performed to the first transparent conductive film d1 selectively to form a scanning signal line GL and a gate electrode GT.