POSITIVE RESIST COMPOSITION AND PRODUCTION OF COLOR FILTER USING THE COMPOSITION

PURPOSE:To produce a positive resist composition excellent in resolution, heat resistance, etc., and to obtain a color filter excellent in spectral characteristics, etc. CONSTITUTION:This positive resist composition contains a resin curable by heat or acid, quinone diazide, a cross-linking agent and...

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Bibliographische Detailangaben
Hauptverfasser:	YAMAMOTO SHIGEKI, HISHIRO YOSHIKI, TAKEYAMA NAOMIKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	PURPOSE:To produce a positive resist composition excellent in resolution, heat resistance, etc., and to obtain a color filter excellent in spectral characteristics, etc. CONSTITUTION:This positive resist composition contains a resin curable by heat or acid, quinone diazide, a cross-linking agent and a pigment 3. The composition is applied on a substrate 5 and exposed through a mask, the exposed part is developed and removed to form a positive colored pattern, and the colored pattern, the unexposed part, is entirely exposed and cured to produce a color filter 7.