SEMICONDUCTOR-WAFER DUSTFREE CONVEYANCE APPARATUS

PURPOSE:To provide a semiconductor-wafer dustfree conveyance apparatus wherein, even when the cleanliness degree of a clean room as a whole is not high, it prevents a semiconductor wafer from being contamined when the wafer is conveyed and its operating time is short. CONSTITUTION:The title apparatu...

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Bibliographische Detailangaben
1. Verfasser: TAKEMURA MASATO
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To provide a semiconductor-wafer dustfree conveyance apparatus wherein, even when the cleanliness degree of a clean room as a whole is not high, it prevents a semiconductor wafer from being contamined when the wafer is conveyed and its operating time is short. CONSTITUTION:The title apparatus is provided with a fan 2 which is provided with a dust filter 1 and which generates a descending air current, with a carrier 5 in which a hole passing the descending air current is formed in the bottom and which houses semiconductor wafers 6 while they are being exposed to the descending air current and with a dustproof wall which surrounds the descending air current.