METHOD FOR EXECUTION OF THIN-METAL LAYER ON POLYMER STRUCTURE

PURPOSE: To maximize the yield of a magnetic material by using a PVD method by vapor deposition of the magnetic material in an oblique angle direction at the time of forming a thin-film metallic layer on a polymer substrate. CONSTITUTION: The web-like substrate 2 passes over such a drum-like support...

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Hauptverfasser: HANSUUPEETAA SHIRUTOBERUKU, HARUTOMUUTO HIBUSUTO, GERUTO FUITSUSHIYAA
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE: To maximize the yield of a magnetic material by using a PVD method by vapor deposition of the magnetic material in an oblique angle direction at the time of forming a thin-film metallic layer on a polymer substrate. CONSTITUTION: The web-like substrate 2 passes over such a drum-like supporting body 1 which has a radius R and of which the revolving shaft is the origin of an x/y coordinate system. Coating screens 3, 3' condense the metallic vapor jet from a crucible evaporator 4 onto the substrate 2 at the point of a range 5. The angel range opened for coating on the substrate 2 is regulated by graduation angles Φ1 , Φ2 and is determined by the position of the evaporator 4. The coordinate base point of the angles Φ2, Φ1 is calculated in the counterclockwise direction starting from the position Xaxis of the coordinate system existing at the revolving shaft of the drum-like supporting body 1. The coordinate system of the evaporator 4 is like equation I. In the equation, A: the max. value of the quantity of the metal vapor butting against the substrate 2, β1 , β2 : the angles between the central perpendicular line of the evaporator 4 and the line connecting the center of the evaporator 4 and the ends of the coating screens 3, 3', (n): the evaporation rate specific to the evaporating metal source and is a value of 2 to 5.