PROJECTION ALIGNER

PURPOSE:To provide a projection aligner where the throughput can be improved through formation of highly accurate pattern and effective exposure process by realizing uninterrupted exposure on a large substrate by adopting simple construction and small luminous flux. CONSTITUTION:A projection aligner...

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Bibliographische Detailangaben
Hauptverfasser:	KIMURA KEIICHI, AKAO SHIGERU
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To provide a projection aligner where the throughput can be improved through formation of highly accurate pattern and effective exposure process by realizing uninterrupted exposure on a large substrate by adopting simple construction and small luminous flux. CONSTITUTION:A projection aligner that exposes a pattern on a mask against a substrate through an optical system is provided with an illuminating optical system 121 for exposing a mask 110, a projection optical system 122 for exposing on a substrate 111 a light 131 transmitting from the mask 110 after being directed through the system 121, and a shifting means that synchronizes and shifts the systems 121 and 122 vertically and horizontally against the mask 110 and substrate 111.