PHOTO-POLYMERIZED COMPOSITION

PURPOSE:To show high sensitivity to visible light, provide excellent adhesion to a support and form a precise and high-resolution pattern by containing graft high copolymer, linear high polymer, monomer, photo-polymerization initiator at respectively specified side chains. CONSTITUTION:Photo-polymer...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: NARITA KICHIHEI, UEHARA SHINICHI, HAGIO SHIGERU, NOGUCHI HIROMICHI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PURPOSE:To show high sensitivity to visible light, provide excellent adhesion to a support and form a precise and high-resolution pattern by containing graft high copolymer, linear high polymer, monomer, photo-polymerization initiator at respectively specified side chains. CONSTITUTION:Photo-polymerized composition contains graft high copolymer that branch chains mainly formed by monomer structural units selected out of (A) hydroxyl group content acrylic monomer, (B) acrylic amide derivative shown by formula I, etc., are added to side chains formed by monomer structural units selected out of alkylmethacrylate, acrylonitryl an styrene groups, monomer such as methylmethacrylate, linear high polymer with monomer structural units selected out of (A), (B) groups, monomer with ethylene unsaturated bonds and photo-polymerization initiator. In formula I, R is a 1-3 hydrogen-atom or carbon-atom numbered alkyl group, and R is a 1-4 hydrogen-atom or carbon- atom numbered alkyl or hydroxy group.