POSITIVE TYPE PHOTOSENSITIVE COMPOSITION

PURPOSE:To provide a positive type photosensitive compsn. having high photosensitivity and usable under light within a wide wavelength range. CONSTITUTION:This positive type photosensitive compsn. contains a compd. (a) having at least two enol ether groups represented by the formula, a linear polyme...

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Bibliographische Detailangaben
Hauptverfasser:	AOTANI NORIMASA, UMEHARA AKIRA, KONDO SHUNICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To provide a positive type photosensitive compsn. having high photosensitivity and usable under light within a wide wavelength range. CONSTITUTION:This positive type photosensitive compsn. contains a compd. (a) having at least two enol ether groups represented by the formula, a linear polymer (b) having an acid component and hydroxyl groups and a compd. (c) which is decomposed and generates an acid when irradiated with active light or radiation and the components (a) (b) are crosslinked with heat. In the formula each of R1-R3 is H, alkyl or aryl and two of them may bond to each other to form a satd. or olefinic unsatd. ring.