METHOD AND DEVICE FOR CLEANING PHOTOMASK

PURPOSE:To provide a method and a device for cleaning a photomask which reduces damages to a wiring pattern surface and also effectively removes foreign matters on a photomask surface at the time of cleaning the photomask. CONSTITUTION:The whole photomask 1 is sunk in a cleaning liquid, a roll 2 wit...

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Bibliographische Detailangaben
1. Verfasser:	TAKEI SHIGEO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	PURPOSE:To provide a method and a device for cleaning a photomask which reduces damages to a wiring pattern surface and also effectively removes foreign matters on a photomask surface at the time of cleaning the photomask. CONSTITUTION:The whole photomask 1 is sunk in a cleaning liquid, a roll 2 with a roll cover 8 approaches the photomask 1. In the gap between them, the flow 5 of the cleaning liquid is caused by a rotation of the roll 2 with variable speed and the cleaning liquid from a cleaning liquid emitting port 3 in front of the gap is ejected and a flow of the cleaning liquid generated by suction of the cleaning liquid by a cleaning liquid suction port 4 in the rear of the gap is caused. Thereby the photomask surface is cleaned.