VAPOR-PHASE CHEMICAL REACTION EQUIPMENT

PURPOSE:To shorten the exhaust time and improve the operating efficiency of an equipment, by installing an auxiliary exhaust mechanism of large conductance and exhausting the gas in a mixing chamber. CONSTITUTION:After a wafer 3 is introduced into a susceptor 1 in a vacuum vessel 4, gas in the vacuu...

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1. Verfasser: TSUTSUMI YOSHITSUGU
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To shorten the exhaust time and improve the operating efficiency of an equipment, by installing an auxiliary exhaust mechanism of large conductance and exhausting the gas in a mixing chamber. CONSTITUTION:After a wafer 3 is introduced into a susceptor 1 in a vacuum vessel 4, gas in the vacuum vessel 4 is evacuated by using an evacuation part 61, via an evacuation piping 6. In this case, a shower head exhaust valve 51 is opened, and the gas in the mixing chamber 22 is exhausted mainly by shower head exhaust piping 5. Since the conductance of the shower head exhaust piping 5 is very large as compared with the conductance of small holes formed in a shower head part 2, the exhaust time is remarkably shortened as compared with the case where the gas is exhausted without using the shower head exhaust piping 5.