FORMATION OF COLOR FILTER PATTERN

PURPOSE:To provide a high-precision, high-quality color filter pattern by radiating excimer laser to a black layer on a transparent substrate to form a black matrix pattern. CONSTITUTION:A black layer, i.e., carbon black ink 102, is uniformly applied on the whole face of a transparent substrate 101...

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Bibliographische Detailangaben
Hauptverfasser:	ISOMI AKIRA, HAGINO MASATO
Format:	Patent
Sprache:	eng
Schlagworte:	DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	PURPOSE:To provide a high-precision, high-quality color filter pattern by radiating excimer laser to a black layer on a transparent substrate to form a black matrix pattern. CONSTITUTION:A black layer, i.e., carbon black ink 102, is uniformly applied on the whole face of a transparent substrate 101 by spin coating or with a roll coater. The film thickness of the carbon black ink 102 is set to about 2mum. An XeCl excimer laser beam 104 is radiated to the transparent substrate 101 face coated with the carbon black ink 102 via a metal mask 103 to form a black matrix pattern 105. R, G, B stripes are printed for each pitch on the transparent substrate 101 formed with the black matrix pattern 105 by intaglio offset printing to form a color filter. A high-quality, high-precision color filter pattern can be formed without using photolithography.