VERIFYING METHOD FOR INTEGRATED CIRCUIT MASK PATTERN

PURPOSE:To provide the verifying method of an integrated circuit mask pattern capable of performing verification in a short processing time by performing an efficient arithmetic operation. CONSTITUTION:The circuit connection information of a first system extracted from the mask pattern and the circu...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: SHIMOHAKAMADA NAOKI, JINBO YASUO
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PURPOSE:To provide the verifying method of an integrated circuit mask pattern capable of performing verification in a short processing time by performing an efficient arithmetic operation. CONSTITUTION:The circuit connection information of a first system extracted from the mask pattern and the circuit connection information of a second system extracted from a circuit diagram are compared and collated in order to verify whether the circuit diagram and the mask pattern designed based on the circuit diagram are equivalent or not (S30). In order to obtain the circuit connection information of the first system, the mask pattern is digitized and inputted (512) and a cell not requiring the verification is specified (S15). Then, a circuit connection information extraction processing (S17) is performed only for the outside of the specified cell, a pseudo circuit is generated (S40) and the circuit connection information of the pseudo circuit is fitted and synthesized for the inside of the specified cell (S18). The information of the part of the specified cell is replaced with the circuit connection information of the pseudo circuit for the circuit connection information of the second system (S23.) By comparing the final circuit connection information of the first system and the second system, the verification for the part except the specified cell can be performed.