PATTERN FORMING METHOD

PURPOSE:To easily form a coating film excellen in precision and to use various materials excellent in heat resistance and solvent resistance by irradiating a material layer with excimer laser light to form a pattern from a transfer body. CONSTITUTION:Silicone resin 2 for peeling is applied on a poly...

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Bibliographische Detailangaben
Hauptverfasser:	ISOMI AKIRA, HAGINO MASATO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY COLOUR PRINTING DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY LINING MACHINES MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTING PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES STAMPS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	PURPOSE:To easily form a coating film excellen in precision and to use various materials excellent in heat resistance and solvent resistance by irradiating a material layer with excimer laser light to form a pattern from a transfer body. CONSTITUTION:Silicone resin 2 for peeling is applied on a polyester film supporting body 1, on which a pattern forming material layer 3 containing coloring pigment dispersed in a thermosetting resin is formed. This pattern forming material layer 3 is irradiated with excimer laser light to form a pattern. The excimer laser uses mixture gas of rare gas Xe and halogen gas Cl2. Then the pattern forming material layer 3 is transferred through an adhesive layer to a transfer substate 7 having a black matrix 8 formed on the substrate. The black matrix 8 is formed by patterning a light-shielding material such as chromium by photolithography. The adhesive layer 9 is required to have tackiness and cohesive force for peeling the pattern forming material layer from the peeling layer 2 and is preferred to the layer having high adhesion strength, heat resistance and solvent resistance after transfer.