JPH058527B

PURPOSE:To obtain an electrically conductive transparent film having surface resistivity within a wide range by specifying the amount of indium to the total amount of indium and silicon in an electrically conductive transparent film contg. mixed oxide consisting of silicon oxide and indium oxide as...

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Bibliographische Detailangaben
Hauptverfasser:	KAWAGUCHI MASAYUKI, OKUDA KOJI, KATSUBE SHIZUKO
Format:	Patent
Sprache:	eng
Schlagworte:	ADVERTISING BASIC ELECTRIC ELEMENTS CABLES CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CONDUCTORS CRYPTOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING DIFFUSION TREATMENT OF METALLIC MATERIAL DISPLAY DISPLAYING EDUCATION ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY FREQUENCY-CHANGING GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INSULATORS JOINING GLASS TO GLASS OR OTHER MATERIALS LABELS OR NAME-PLATES METALLURGY MINERAL OR SLAG WOOL NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS SEALS SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES SIGNS SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	PURPOSE:To obtain an electrically conductive transparent film having surface resistivity within a wide range by specifying the amount of indium to the total amount of indium and silicon in an electrically conductive transparent film contg. mixed oxide consisting of silicon oxide and indium oxide as the principal component. CONSTITUTION:An electrically conductive transparent film contg. mixed oxide consisting of silicon oxide and indium oxide as the principal component is formed on a glass substrate by an electron beam heating-vapor deposition method with pellets of silicon oxide mixed with indium oxide as a material to be vapor-deposited. At this time, the amount of indium in the film is regulated to >=25wt% of the total amount of indium and silicon. Thus, an electrically conductive transparent film having about 10 -10 OMEGA/sq. surface resistivity is obtd.