SEMICONDUCTOR MANUFACTURING EQUIPMENT

PURPOSE:To obtain uniform film quality by simple constitution, in a semiconductor manufacturing equipment wherein a film is formed by making growth gas flow in a reaction chamber. CONSTITUTION:Inner tubes 15b, 16 which are separated to be an upper part and a lower part, respectively, by an inner exh...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: HIGASHIMOTO MASAYUKI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PURPOSE:To obtain uniform film quality by simple constitution, in a semiconductor manufacturing equipment wherein a film is formed by making growth gas flow in a reaction chamber. CONSTITUTION:Inner tubes 15b, 16 which are separated to be an upper part and a lower part, respectively, by an inner exhaust opening 18 are installed. Growth gas nozzles 20a and 20b which discharge growth gas in the inner tubes 16 and 15b are installed at the lower part of the inner tube 16 and the upper part of the inner tube 15b, respectively.