JPH055162B
PURPOSE:To realize pattern transcription by reducing projection with SOR light by a method wherein a mask pattern is reduced, and the sample is moved by reduction at the same proportion as the ratio of reduction to a mask. CONSTITUTION:The titled device is arranged so that the SOR light 11 formed in...
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| creator | HAYASAKA TOA IDO SATOSHI KITAYAMA TOYOKI |
| description | PURPOSE:To realize pattern transcription by reducing projection with SOR light by a method wherein a mask pattern is reduced, and the sample is moved by reduction at the same proportion as the ratio of reduction to a mask. CONSTITUTION:The titled device is arranged so that the SOR light 11 formed into band parallel beams by a condensing mirror may be incident vertically to the mask 12 and the sample 13. An X-ray reducing optical system 14 to reduce the mask pattern at a suitable proportion e.g. at 1/N is arranged between the mask 12 and the sample 13. In this configuration, when the mask 12 and the sample 13 are moved at the same time while the ratio of movement distance is kept at the same proportion as the reduction ratio 1/N of the reducing optical system, the SOR light 11 is reduced by a factor of 1/N in a stationary state and then transcribed on the sample. In other words, sweeping the mask in the X direction with a brush of SOR light enables the band part of sweeping to be contracted to 1/N and transcribed on the sample. |
| format | Patent |
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CONSTITUTION:The titled device is arranged so that the SOR light 11 formed into band parallel beams by a condensing mirror may be incident vertically to the mask 12 and the sample 13. An X-ray reducing optical system 14 to reduce the mask pattern at a suitable proportion e.g. at 1/N is arranged between the mask 12 and the sample 13. In this configuration, when the mask 12 and the sample 13 are moved at the same time while the ratio of movement distance is kept at the same proportion as the reduction ratio 1/N of the reducing optical system, the SOR light 11 is reduced by a factor of 1/N in a stationary state and then transcribed on the sample. In other words, sweeping the mask in the X direction with a brush of SOR light enables the band part of sweeping to be contracted to 1/N and transcribed on the sample.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>1993</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19930121&DB=EPODOC&CC=JP&NR=H055162B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19930121&DB=EPODOC&CC=JP&NR=H055162B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HAYASAKA TOA</creatorcontrib><creatorcontrib>IDO SATOSHI</creatorcontrib><creatorcontrib>KITAYAMA TOYOKI</creatorcontrib><title>JPH055162B</title><description>PURPOSE:To realize pattern transcription by reducing projection with SOR light by a method wherein a mask pattern is reduced, and the sample is moved by reduction at the same proportion as the ratio of reduction to a mask. CONSTITUTION:The titled device is arranged so that the SOR light 11 formed into band parallel beams by a condensing mirror may be incident vertically to the mask 12 and the sample 13. An X-ray reducing optical system 14 to reduce the mask pattern at a suitable proportion e.g. at 1/N is arranged between the mask 12 and the sample 13. In this configuration, when the mask 12 and the sample 13 are moved at the same time while the ratio of movement distance is kept at the same proportion as the reduction ratio 1/N of the reducing optical system, the SOR light 11 is reduced by a factor of 1/N in a stationary state and then transcribed on the sample. In other words, sweeping the mask in the X direction with a brush of SOR light enables the band part of sweeping to be contracted to 1/N and transcribed on the sample.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1993</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZODyCvAwMDU1NDNy4mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8QgNTkbGxKgBAC9eG5o</recordid><startdate>19930121</startdate><enddate>19930121</enddate><creator>HAYASAKA TOA</creator><creator>IDO SATOSHI</creator><creator>KITAYAMA TOYOKI</creator><scope>EVB</scope></search><sort><creationdate>19930121</creationdate><title>JPH055162B</title><author>HAYASAKA TOA ; IDO SATOSHI ; KITAYAMA TOYOKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH055162BB23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1993</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>HAYASAKA TOA</creatorcontrib><creatorcontrib>IDO SATOSHI</creatorcontrib><creatorcontrib>KITAYAMA TOYOKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HAYASAKA TOA</au><au>IDO SATOSHI</au><au>KITAYAMA TOYOKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>JPH055162B</title><date>1993-01-21</date><risdate>1993</risdate><abstract>PURPOSE:To realize pattern transcription by reducing projection with SOR light by a method wherein a mask pattern is reduced, and the sample is moved by reduction at the same proportion as the ratio of reduction to a mask. CONSTITUTION:The titled device is arranged so that the SOR light 11 formed into band parallel beams by a condensing mirror may be incident vertically to the mask 12 and the sample 13. An X-ray reducing optical system 14 to reduce the mask pattern at a suitable proportion e.g. at 1/N is arranged between the mask 12 and the sample 13. In this configuration, when the mask 12 and the sample 13 are moved at the same time while the ratio of movement distance is kept at the same proportion as the reduction ratio 1/N of the reducing optical system, the SOR light 11 is reduced by a factor of 1/N in a stationary state and then transcribed on the sample. In other words, sweeping the mask in the X direction with a brush of SOR light enables the band part of sweeping to be contracted to 1/N and transcribed on the sample.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | JPH055162B |
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