JPH055162B

PURPOSE:To realize pattern transcription by reducing projection with SOR light by a method wherein a mask pattern is reduced, and the sample is moved by reduction at the same proportion as the ratio of reduction to a mask. CONSTITUTION:The titled device is arranged so that the SOR light 11 formed into band parallel beams by a condensing mirror may be incident vertically to the mask 12 and the sample 13. An X-ray reducing optical system 14 to reduce the mask pattern at a suitable proportion e.g. at 1/N is arranged between the mask 12 and the sample 13. In this configuration, when the mask 12 and the sample 13 are moved at the same time while the ratio of movement distance is kept at the same proportion as the reduction ratio 1/N of the reducing optical system, the SOR light 11 is reduced by a factor of 1/N in a stationary state and then transcribed on the sample. In other words, sweeping the mask in the X direction with a brush of SOR light enables the band part of sweeping to be contracted to 1/N and transcribed on the sample.