JPH05333336

PURPOSE:To decrease the pickup of the dust generated at the time of rubbing on an oriented film and to obtain the liquid crystal display element having a high display grade by setting a rubbing machine and a substrate to be rubbed within a constant temp. and constant humidity chamber and subjecting...

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Bibliographische Detailangaben
Hauptverfasser: MATSUKAWA HIDEKI, MORI KOSHIRO, TATEMICHI TOSHIO
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To decrease the pickup of the dust generated at the time of rubbing on an oriented film and to obtain the liquid crystal display element having a high display grade by setting a rubbing machine and a substrate to be rubbed within a constant temp. and constant humidity chamber and subjecting the oriented film to a rubbing treatment. CONSTITUTION:A roller 1 wound with a cloth 2 for rubbing is rotated and the substrate 3 installed on a stage 4 is subjected to the rubbing treatment. These work parts are installed in the constant temp. and constant humidity chamber 5. The humidity in the constant temp. and constant humidity chamber 5 is controlled and maintained at a prescribed degree by a control section 6 for maintaining a specified environment in the chamber, by which the static electricity to be generated on the substrate 3 surface by mechanical friction is lowered. Namely, the rubbing machine and the substrate 3 to be rubbed are installed in the constant temp. and constant humidity chamber 5 and, therefore, the attraction of the dust generated by peeling of the oriented film by friction and the cut pieces of the cloth 2 for rubbing is lessened. The fiber diameter of the cloth 2 for rubbing is treated to be gradually reduced, by which the surface shape of the oriented film surface is improved.