SEMICONDUCTOR INTEGRATED CIRCUIT
PURPOSE:To stabilize substrate potential of a semiconductor integrated circuit having an MOSFET and to stabilize operation of the MOSFET. CONSTITUTION:N-channel and P-channel MOSFET are formed on an upper surface of a P-type silicon substrate 1 provided with a P-type diffusion layer 3 whose conducti...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | PURPOSE:To stabilize substrate potential of a semiconductor integrated circuit having an MOSFET and to stabilize operation of the MOSFET. CONSTITUTION:N-channel and P-channel MOSFET are formed on an upper surface of a P-type silicon substrate 1 provided with a P-type diffusion layer 3 whose conductivity is improved by introducing P-type impurities to a lower side, and voltage change due to movement of carrier is restrained by the P-type diffusion layer 3; thereby, substrate potential is stabilized. |
---|