SEMICONDUCTOR MANUFACTURE APPARATUS
PURPOSE:To reduce particles adhering to a semiconductor wafer inside a reaction chamber in a CVD apparatus or the like. CONSTITUTION:A CVD apparatus 1 is formed in the following manner: gas- blowoff preventive covers 11 are installed near opening parts 9a for gas introduction pipes 9 which are insta...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | PURPOSE:To reduce particles adhering to a semiconductor wafer inside a reaction chamber in a CVD apparatus or the like. CONSTITUTION:A CVD apparatus 1 is formed in the following manner: gas- blowoff preventive covers 11 are installed near opening parts 9a for gas introduction pipes 9 which are installed inside a reaction chamber 4 which houses semiconductor wafers 5; and a gas which is spouted from the opening parts 9a is not blown directly onto the semiconductor wafers 5. |
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