DEVELOPING METHOD AND DEVELOPING DEVICE

PURPOSE:To obtain the developing method and developing device which maintains the specified temp. of a developer for forming resist patterns and makes development with the min. required amt. of the developer. CONSTITUTION:A top plate is brought near to a substrate 1 in parallel 2 therewith and the d...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	TAKEI SHIGEO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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