DEVELOPING METHOD AND DEVELOPING DEVICE

PURPOSE:To obtain the developing method and developing device which maintains the specified temp. of a developer for forming resist patterns and makes development with the min. required amt. of the developer. CONSTITUTION:A top plate is brought near to a substrate 1 in parallel 2 therewith and the d...

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Bibliographische Detailangaben
1. Verfasser:	TAKEI SHIGEO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To obtain the developing method and developing device which maintains the specified temp. of a developer for forming resist patterns and makes development with the min. required amt. of the developer. CONSTITUTION:A top plate is brought near to a substrate 1 in parallel 2 therewith and the developer 6 is held between the substrate 1 and the top plate 2. The photosensitive layer of the substrate 1 is developed by the developer 6. The contact area of the developer 6 with air decreases and the temp. change by evaporation heat, etc., decreases. The accuracy of the photosensitive pattern to be developed is thus improved. The volume of the developer necessary for the development is extremely decreased by supporting the developer 6 with surface tension. A constant-temp. circulating liquid 7 is run in a substrate holding plate 4 holding the substrate 1 and the top plate 2 to maintain the specified temp. of the substrate holding plate 4 and the top plate 2, by which the temp. of the developer 6 is kept further constant.