PHOTOSENSITIVE PHOTORESIST COMPOSITION

PURPOSE:To provide a photosensitive photoresist composition excellent in a standing wave effect and the other various performance. CONSTITUTION:A photosensitive photoresist composition is one kind selected out of groups consisting of the combination of a quinonediazide compound, light acid producing...

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Bibliographische Detailangaben
Hauptverfasser:	KAMIYA YASUNORI, TAKEYAMA NAOMIKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To provide a photosensitive photoresist composition excellent in a standing wave effect and the other various performance. CONSTITUTION:A photosensitive photoresist composition is one kind selected out of groups consisting of the combination of a quinonediazide compound, light acid producing agent, and a cross linking agent, and the combination of a light acid producing agent and a solution preventing agent, and also contains alkaline soluble resin; and it is characterized in that a light-absorbing agent having such a characteristic that the absorbance increases as the increase in the light exposure in the light exposure wavelengths is added thereto, so that the absorbance of the composition becomes nearly constant independently of the exposure value in the light exposure wavelengths.