JPH05285825

PURPOSE:To provide a polishing device capable of improving flatness microscopically by way of uniforming the contact state of an abrasive cloth surface and a sample polished surface, improving flatness of a sample and uniforming a polishing amount to the sample polished surface macroscopically. CONS...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	BEPPU TOSHIYASU, WATANABE JUNJI
Format:	Patent
Sprache:	eng
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING
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Beschreibung
Zusammenfassung:	PURPOSE:To provide a polishing device capable of improving flatness microscopically by way of uniforming the contact state of an abrasive cloth surface and a sample polished surface, improving flatness of a sample and uniforming a polishing amount to the sample polished surface macroscopically. CONSTITUTION:On the opposite side of a sample holding pedestal 3 free to rotate, placing a sample B on it, a rotatable polishing disc 1 is arranged, and on its bottom face, an abrasive cloth 2 is affixed through an elastic body 201. Polish is carried out as the polishing disc 1 and the sample holding pedestal 3 rotate, an abrasive 8 is supplied between the abrasive cloth 2 and the sample polished surface and the abrasive cloth 2 makes contact with the sample B in a narrow range.