JPH05251291

PURPOSE: To produce a stable shelf-life silicon wafer surface having an advanta geous oxidation characteristic by using haloalkyl silane having a chemical formula R x SiR y (OR )4-x-y and haloalkyl disilazane having a chemical formula (R x R 3-x Si)2 NH as an organic silicon reagent. CONSTITUTION: Hydrophilic processing using hydrogen peroxide/ammonia is substantially applied to a silicon wafer of which one side is polished in accordance with 'RCA cleaning'. Then the wafer is rinsed and dried and then the organic silicon reagent is applied to the dried wafer. In this case, haloalkyl silane having a chemical formula R x SiR y (OR )4-x-y and haloalkyl disilazane having a chemical formula (R x R 3-x Si)2 NH are used as organic silicon reagent (wherein R is haloalkyl radical, R is alkyl radical, x is an integer of 1 to 3, and y is 0 or 1). Consequently the treated wafer surface can be provided with excellent shelf-life stability.