X-RAY ALIGNER
PURPOSE:To maximize the intensity of an X-ray on an exposure face and realize X-ray irradiation infinitely close to direct incidence by locating a bundle of small tubes so that the X-ray entrance ends of the small tubes will be in proximity to and along the orbit of an electron beam and the X-ray ex...
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| creator | SHIMANO HIROKI KITAYAMA TOYOKI |
| description | PURPOSE:To maximize the intensity of an X-ray on an exposure face and realize X-ray irradiation infinitely close to direct incidence by locating a bundle of small tubes so that the X-ray entrance ends of the small tubes will be in proximity to and along the orbit of an electron beam and the X-ray exit ends thereof in parallel with the main optical axis of the X-ray optical system. CONSTITUTION:A plurality of small tubes 8 are bent at an appropriate curvature so that an X-ray will be deflected through reflection by the internal walls thereof. The tubes 8 are so installed as to take in an X-ray from a light source 2. The bundle of the small tubes is so located that the X-ray entrance ends thereof will be in proximity to and along the orbit of an electron beam and the X-ray exit ends thereof will be in parallel with the main optical axis 3 of the X-ray optical system. This maximizes the intensity of an X-ray on an exposure plane by effectively focusing synchrotron radiation light scattering from the light source in horizontal and vertical directions. It is also possible to realize X-ray irradiation in a state which is infinitely close direct incidence throughout the region of exposure. |
| format | Patent |
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CONSTITUTION:A plurality of small tubes 8 are bent at an appropriate curvature so that an X-ray will be deflected through reflection by the internal walls thereof. The tubes 8 are so installed as to take in an X-ray from a light source 2. The bundle of the small tubes is so located that the X-ray entrance ends thereof will be in proximity to and along the orbit of an electron beam and the X-ray exit ends thereof will be in parallel with the main optical axis 3 of the X-ray optical system. This maximizes the intensity of an X-ray on an exposure plane by effectively focusing synchrotron radiation light scattering from the light source in horizontal and vertical directions. It is also possible to realize X-ray irradiation in a state which is infinitely close direct incidence throughout the region of exposure.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>1993</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19930827&DB=EPODOC&CC=JP&NR=H05217860A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19930827&DB=EPODOC&CC=JP&NR=H05217860A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SHIMANO HIROKI</creatorcontrib><creatorcontrib>KITAYAMA TOYOKI</creatorcontrib><title>X-RAY ALIGNER</title><description>PURPOSE:To maximize the intensity of an X-ray on an exposure face and realize X-ray irradiation infinitely close to direct incidence by locating a bundle of small tubes so that the X-ray entrance ends of the small tubes will be in proximity to and along the orbit of an electron beam and the X-ray exit ends thereof in parallel with the main optical axis of the X-ray optical system. CONSTITUTION:A plurality of small tubes 8 are bent at an appropriate curvature so that an X-ray will be deflected through reflection by the internal walls thereof. The tubes 8 are so installed as to take in an X-ray from a light source 2. The bundle of the small tubes is so located that the X-ray entrance ends thereof will be in proximity to and along the orbit of an electron beam and the X-ray exit ends thereof will be in parallel with the main optical axis 3 of the X-ray optical system. This maximizes the intensity of an X-ray on an exposure plane by effectively focusing synchrotron radiation light scattering from the light source in horizontal and vertical directions. It is also possible to realize X-ray irradiation in a state which is infinitely close direct incidence throughout the region of exposure.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1993</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZOCN0A1yjFRw9PF093MN4mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8V4BHgamRobmFmYGjsbEqAEApnQcww</recordid><startdate>19930827</startdate><enddate>19930827</enddate><creator>SHIMANO HIROKI</creator><creator>KITAYAMA TOYOKI</creator><scope>EVB</scope></search><sort><creationdate>19930827</creationdate><title>X-RAY ALIGNER</title><author>SHIMANO HIROKI ; KITAYAMA TOYOKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH05217860A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1993</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>SHIMANO HIROKI</creatorcontrib><creatorcontrib>KITAYAMA TOYOKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SHIMANO HIROKI</au><au>KITAYAMA TOYOKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>X-RAY ALIGNER</title><date>1993-08-27</date><risdate>1993</risdate><abstract>PURPOSE:To maximize the intensity of an X-ray on an exposure face and realize X-ray irradiation infinitely close to direct incidence by locating a bundle of small tubes so that the X-ray entrance ends of the small tubes will be in proximity to and along the orbit of an electron beam and the X-ray exit ends thereof in parallel with the main optical axis of the X-ray optical system. CONSTITUTION:A plurality of small tubes 8 are bent at an appropriate curvature so that an X-ray will be deflected through reflection by the internal walls thereof. The tubes 8 are so installed as to take in an X-ray from a light source 2. The bundle of the small tubes is so located that the X-ray entrance ends thereof will be in proximity to and along the orbit of an electron beam and the X-ray exit ends thereof will be in parallel with the main optical axis 3 of the X-ray optical system. This maximizes the intensity of an X-ray on an exposure plane by effectively focusing synchrotron radiation light scattering from the light source in horizontal and vertical directions. It is also possible to realize X-ray irradiation in a state which is infinitely close direct incidence throughout the region of exposure.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | X-RAY ALIGNER |
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