MANUFACTURE OF CAPACITIVE TYPE SENSOR AND CAPACITIVE TYPE SENSOR

PURPOSE: To eliminate the influences of regulating error of a cut position and the change of cut width in the case of individually separating sensors by manufacturing capacity type sensors each having an accurately limited stray capacitance in mass production in parallel. CONSTITUTION: The capacity...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HERUMUUTO BAUMAN, MARUTEIN BUIRUMAN, GIYUNTAA FUINDORAA, IIRI MAREKU, MIHIYAERU OTSUFUENBERUKU
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE: To eliminate the influences of regulating error of a cut position and the change of cut width in the case of individually separating sensors by manufacturing capacity type sensors each having an accurately limited stray capacitance in mass production in parallel. CONSTITUTION: The capacity type sensor made by insulating at least one plates 2, 4 from at least one single crystal wafer 3 and coupling it is manufactured by dividing the composite material of the wafer 3 and the plates 2, 4 along a dividing line 6. Grooves 15, 16, 17 are provided on the line b or in parallel with the line 6 so that the individual sensors have cutouts 2, 26 at the edges of the wafer 3 and/ or plates 2, 4.