CHEMICAL-LIQUID TREATMENT APPARATUS
PURPOSE:To separately discharge and collect a plurality of waste liquids which have been treated in one chemical-liquid treatment apparatus. CONSTITUTION:A treatment cup which constitutes a chemical-liquid treatment apparatus is formed, to be double, of an outside cup 1 and an inside cup 2; individu...
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| creator | TANAKA KAZUYOSHI TSUBOKA TOMOAKI |
| description | PURPOSE:To separately discharge and collect a plurality of waste liquids which have been treated in one chemical-liquid treatment apparatus. CONSTITUTION:A treatment cup which constitutes a chemical-liquid treatment apparatus is formed, to be double, of an outside cup 1 and an inside cup 2; individual waste liquids 53, 63 produced in a treatment by a first chemical liquid 5 and in a treatment by a second chemical liquid 6 are separated into and housed in the first cup 1 and the second cup 2; the waste liquids 53, 63 are discharged from the respective cups. Since the waste liquids 53, 63 are collected separately with high accuracy, the waste liquids can easily be treated in a developing operation, a treatment liquid can be reused and a waste-liquid treatment installation can be simplified. |
| format | Patent |
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CONSTITUTION:A treatment cup which constitutes a chemical-liquid treatment apparatus is formed, to be double, of an outside cup 1 and an inside cup 2; individual waste liquids 53, 63 produced in a treatment by a first chemical liquid 5 and in a treatment by a second chemical liquid 6 are separated into and housed in the first cup 1 and the second cup 2; the waste liquids 53, 63 are discharged from the respective cups. Since the waste liquids 53, 63 are collected separately with high accuracy, the waste liquids can easily be treated in a developing operation, a treatment liquid can be reused and a waste-liquid treatment installation can be simplified.</description><language>eng</language><subject>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; APPARATUS SPECIALLY ADAPTED THEREFOR ; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES ; SPRAYING OR ATOMISING IN GENERAL ; TRANSPORTING</subject><creationdate>1993</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19930730&DB=EPODOC&CC=JP&NR=H05190442A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19930730&DB=EPODOC&CC=JP&NR=H05190442A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TANAKA KAZUYOSHI</creatorcontrib><creatorcontrib>TSUBOKA TOMOAKI</creatorcontrib><title>CHEMICAL-LIQUID TREATMENT APPARATUS</title><description>PURPOSE:To separately discharge and collect a plurality of waste liquids which have been treated in one chemical-liquid treatment apparatus. 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CONSTITUTION:A treatment cup which constitutes a chemical-liquid treatment apparatus is formed, to be double, of an outside cup 1 and an inside cup 2; individual waste liquids 53, 63 produced in a treatment by a first chemical liquid 5 and in a treatment by a second chemical liquid 6 are separated into and housed in the first cup 1 and the second cup 2; the waste liquids 53, 63 are discharged from the respective cups. Since the waste liquids 53, 63 are collected separately with high accuracy, the waste liquids can easily be treated in a developing operation, a treatment liquid can be reused and a waste-liquid treatment installation can be simplified.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
| title | CHEMICAL-LIQUID TREATMENT APPARATUS |
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