CHEMICAL-LIQUID TREATMENT APPARATUS

PURPOSE:To separately discharge and collect a plurality of waste liquids which have been treated in one chemical-liquid treatment apparatus. CONSTITUTION:A treatment cup which constitutes a chemical-liquid treatment apparatus is formed, to be double, of an outside cup 1 and an inside cup 2; individu...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	TANAKA KAZUYOSHI, TSUBOKA TOMOAKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	PURPOSE:To separately discharge and collect a plurality of waste liquids which have been treated in one chemical-liquid treatment apparatus. CONSTITUTION:A treatment cup which constitutes a chemical-liquid treatment apparatus is formed, to be double, of an outside cup 1 and an inside cup 2; individual waste liquids 53, 63 produced in a treatment by a first chemical liquid 5 and in a treatment by a second chemical liquid 6 are separated into and housed in the first cup 1 and the second cup 2; the waste liquids 53, 63 are discharged from the respective cups. Since the waste liquids 53, 63 are collected separately with high accuracy, the waste liquids can easily be treated in a developing operation, a treatment liquid can be reused and a waste-liquid treatment installation can be simplified.