POSITIVE TYPE RESIST COMPOSITION
PURPOSE:To obtain the positive type resist compsn. which is excellent in the balance of various performances, such as heat resistance and sensitivity, by incorporating a specific alkaline soluble resin and quinone diazide compd. into the compsn. CONSTITUTION:The alkaline soluble resin contg. the res...
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| creator | OZAKI HARUKI NAGASE KYOKO MORIUMA HIROSHI |
| description | PURPOSE:To obtain the positive type resist compsn. which is excellent in the balance of various performances, such as heat resistance and sensitivity, by incorporating a specific alkaline soluble resin and quinone diazide compd. into the compsn. CONSTITUTION:The alkaline soluble resin contg. the resin obtd. by condensing one or >=2 kinds of the phenols expressed by formula I and one or >=2 kinds of the compd. expressed by formula II and aldehydes as well as the quinone diazide compd. are incorporated into this compsn. In the formula I, R1 to R3 denote a hydrogen atom or 1 o 4C alkyl, etc.; (k) denotes 1 or 2. In the formula II, at least either of Y1 or Y2 is a hydroxyl group and are respectively a hydrogen atom, hydroxyl group, etc.; at least two of Z1 to Z7 are hydroxyl groups and are respectively a hydrogen atom, halogen atom, etc.; at least either of R7 or R8 of R4 to R8 is 1 to 10C alkyl group, 2 to 4C alkenyl group, cyclihexyl group or aryl group and respectively denote a hydrogen atom, 1 to 10C alkyl group, etc. Then, the balance of the various performances, such as heat resistance and sensitivity, is improved. |
| format | Patent |
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CONSTITUTION:The alkaline soluble resin contg. the resin obtd. by condensing one or >=2 kinds of the phenols expressed by formula I and one or >=2 kinds of the compd. expressed by formula II and aldehydes as well as the quinone diazide compd. are incorporated into this compsn. In the formula I, R1 to R3 denote a hydrogen atom or 1 o 4C alkyl, etc.; (k) denotes 1 or 2. In the formula II, at least either of Y1 or Y2 is a hydroxyl group and are respectively a hydrogen atom, hydroxyl group, etc.; at least two of Z1 to Z7 are hydroxyl groups and are respectively a hydrogen atom, halogen atom, etc.; at least either of R7 or R8 of R4 to R8 is 1 to 10C alkyl group, 2 to 4C alkenyl group, cyclihexyl group or aryl group and respectively denote a hydrogen atom, 1 to 10C alkyl group, etc. Then, the balance of the various performances, such as heat resistance and sensitivity, is improved.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>1993</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19930730&DB=EPODOC&CC=JP&NR=H05188590A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19930730&DB=EPODOC&CC=JP&NR=H05188590A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OZAKI HARUKI</creatorcontrib><creatorcontrib>NAGASE KYOKO</creatorcontrib><creatorcontrib>MORIUMA HIROSHI</creatorcontrib><title>POSITIVE TYPE RESIST COMPOSITION</title><description>PURPOSE:To obtain the positive type resist compsn. which is excellent in the balance of various performances, such as heat resistance and sensitivity, by incorporating a specific alkaline soluble resin and quinone diazide compd. into the compsn. CONSTITUTION:The alkaline soluble resin contg. the resin obtd. by condensing one or >=2 kinds of the phenols expressed by formula I and one or >=2 kinds of the compd. expressed by formula II and aldehydes as well as the quinone diazide compd. are incorporated into this compsn. In the formula I, R1 to R3 denote a hydrogen atom or 1 o 4C alkyl, etc.; (k) denotes 1 or 2. In the formula II, at least either of Y1 or Y2 is a hydroxyl group and are respectively a hydrogen atom, hydroxyl group, etc.; at least two of Z1 to Z7 are hydroxyl groups and are respectively a hydrogen atom, halogen atom, etc.; at least either of R7 or R8 of R4 to R8 is 1 to 10C alkyl group, 2 to 4C alkenyl group, cyclihexyl group or aryl group and respectively denote a hydrogen atom, 1 to 10C alkyl group, etc. Then, the balance of the various performances, such as heat resistance and sensitivity, is improved.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1993</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAI8A_2DPEMc1UIiQxwVQhyDfYMDlFw9veFiPv78TCwpiXmFKfyQmluBkU31xBnD93Ugvz41OKCxOTUvNSSeK8ADwNTQwsLU0sDR2Ni1AAAJt0ilA</recordid><startdate>19930730</startdate><enddate>19930730</enddate><creator>OZAKI HARUKI</creator><creator>NAGASE KYOKO</creator><creator>MORIUMA HIROSHI</creator><scope>EVB</scope></search><sort><creationdate>19930730</creationdate><title>POSITIVE TYPE RESIST COMPOSITION</title><author>OZAKI HARUKI ; NAGASE KYOKO ; MORIUMA HIROSHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH05188590A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1993</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>OZAKI HARUKI</creatorcontrib><creatorcontrib>NAGASE KYOKO</creatorcontrib><creatorcontrib>MORIUMA HIROSHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OZAKI HARUKI</au><au>NAGASE KYOKO</au><au>MORIUMA HIROSHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>POSITIVE TYPE RESIST COMPOSITION</title><date>1993-07-30</date><risdate>1993</risdate><abstract>PURPOSE:To obtain the positive type resist compsn. which is excellent in the balance of various performances, such as heat resistance and sensitivity, by incorporating a specific alkaline soluble resin and quinone diazide compd. into the compsn. CONSTITUTION:The alkaline soluble resin contg. the resin obtd. by condensing one or >=2 kinds of the phenols expressed by formula I and one or >=2 kinds of the compd. expressed by formula II and aldehydes as well as the quinone diazide compd. are incorporated into this compsn. In the formula I, R1 to R3 denote a hydrogen atom or 1 o 4C alkyl, etc.; (k) denotes 1 or 2. In the formula II, at least either of Y1 or Y2 is a hydroxyl group and are respectively a hydrogen atom, hydroxyl group, etc.; at least two of Z1 to Z7 are hydroxyl groups and are respectively a hydrogen atom, halogen atom, etc.; at least either of R7 or R8 of R4 to R8 is 1 to 10C alkyl group, 2 to 4C alkenyl group, cyclihexyl group or aryl group and respectively denote a hydrogen atom, 1 to 10C alkyl group, etc. Then, the balance of the various performances, such as heat resistance and sensitivity, is improved.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | POSITIVE TYPE RESIST COMPOSITION |
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