VACUUM DEVICE

PURPOSE:To suppress the intrusion of foreign matter such as oxygen and steam in the outside from a vacuum spare chamber to a vacuum treating chamber particularly as much as possible at the time of transferring an object to be treated in a vacuum device of a load locking system. CONSTITUTION:In the t...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	TANAHASHI HIDEKI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PURPOSE:To suppress the intrusion of foreign matter such as oxygen and steam in the outside from a vacuum spare chamber to a vacuum treating chamber particularly as much as possible at the time of transferring an object to be treated in a vacuum device of a load locking system. CONSTITUTION:In the treating chamber 1 of the vacuum apparatus of a load locking system, a gas opening part 2 for regulating pressure and a wall 7 isolating a discharging part are provided, by that, the intrusion of foreign matter from the outside can be suppressed as much as possible. The effect of suppressing the intrusion of foreign matter affecting adversely on the object and a vacuum treating chamber is obtained.