METHOD FOR FITTING ELECTRON GUN

PURPOSE:To fit an electron gun of excellent characteristic by decreasing improper landing and cut off voltage dispersion or the like. CONSTITUTION:The third, fourth and fifth grids 11 to 13 of constituting a main lens system are performed with beading with pins 11a to 13a as a contact. However in a...

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Bibliographische Detailangaben
Hauptverfasser: MITOKU MASATAKA, KARASAWA JOJI, IMABAYASHI HIROTOMO, KURAMOTO FUMIO
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To fit an electron gun of excellent characteristic by decreasing improper landing and cut off voltage dispersion or the like. CONSTITUTION:The third, fourth and fifth grids 11 to 13 of constituting a main lens system are performed with beading with pins 11a to 13a as a contact. However in a prefocus system, beading of only a pin 15a for the second grid 15 is performed as a contact. The first grid 17 and the second grid 15 or the like are built separately from the main lens system. Thereafter, the prefocus system is welded to the pin 15a and integrally formed with the main lens system. Accordingly, since beading of the prefocus system is not performed, a pressure at the time of beading is not applied to each part of the prefocus system, and these parts can be prevented from being deformed.