METHOD AND DEVICE FOR TRANSFERRING RUGGED PATTERN

PURPOSE:To excellently form a rugged pattern on the surface of the oriented film of a substrate for a liquid crystal element. CONSTITUTION:This device is constituted of a curved mold 1 having the surface where the rugged pattern which should be transferred is formed, a holding mechanism 2 holding a...

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Bibliographische Detailangaben
Hauptverfasser:	ISHIDAKA YOSHIHIKO, SUGAWARA SEIZO, KANO MITSURU
Format:	Patent
Sprache:	eng
Schlagworte:	DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	PURPOSE:To excellently form a rugged pattern on the surface of the oriented film of a substrate for a liquid crystal element. CONSTITUTION:This device is constituted of a curved mold 1 having the surface where the rugged pattern which should be transferred is formed, a holding mechanism 2 holding a substance to be transferred 6 under the mold 1, and a pressing means 3 which moves the abutting position of the mold 1 on the substance to be transferred 6 while press-contacting the mold 1 with the substance to be transferred 6.