JPH0514903B
A substrate for an amorphous silicon photoreceptor prepared by first forming an amorphous silicon photoreceptive layer on an aluminum or aluminum alloy body by using a plasma CVD apparatus, and by arranging so that those crystal grains located in the surface of the substrate each has a diameter of 1...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A substrate for an amorphous silicon photoreceptor prepared by first forming an amorphous silicon photoreceptive layer on an aluminum or aluminum alloy body by using a plasma CVD apparatus, and by arranging so that those crystal grains located in the surface of the substrate each has a diameter of 1 cm or smaller, to thereby make it possible to obtain a satisfactory image stably and repetitively. |
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