DEWATERING SOLVENT

PURPOSE:To suppress the chlorination of the composition of the dewatering solvent and to maintain its dewatering capacity over a long period by adding acetone dimethylacetal to the dewatering solvent obtained by adding 2,2,3,3,3- pentafluoropropanol to a specified completely fluorinated compd. CONST...

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Bibliographische Detailangaben
1. Verfasser:	DOGE KAZUYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY
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Beschreibung
Zusammenfassung:	PURPOSE:To suppress the chlorination of the composition of the dewatering solvent and to maintain its dewatering capacity over a long period by adding acetone dimethylacetal to the dewatering solvent obtained by adding 2,2,3,3,3- pentafluoropropanol to a specified completely fluorinated compd. CONSTITUTION:After the parts of precision instruments are cleaned with water, the water remaining on the parts is rapidly removed, and the parts are dried. A solvent obtained by adding 2,2,3,3,3-pentafluoropropanol (5FP) having extremely high dewatering performance and 0.5-1.0% of acetone dimethylacetal (ADA) capable of inhibiting the vaporiazation of 5FP to a completely fluorinated compd. such as perfluorodimethylcyclobutane having 30-150 deg.C b.p. is used as the dewatering solvent to be used in dewatering and cleaning. A decrease in the concn. of the vaporizable 5FP is suppressed by addition of ADA, and a dewatering soln. maintaining dewatering performance over a long period is obtained.