SECONDARY PLATING METHOD OF ROTARY SCREEN OR CYLINDRICAL MESH FOR ROTARY SCREEN

PURPOSE:To attain a high quality plating on a low strength cylindrical mesh for a rotary screen by plating on the mesh winded and hooked between a horizontal rotary shaft which is a cathode electrode on an upper part of plating bath and a rotary shaft in the plating bath. CONSTITUTION:The cylindrica...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: TAKAKURA KOICHI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PURPOSE:To attain a high quality plating on a low strength cylindrical mesh for a rotary screen by plating on the mesh winded and hooked between a horizontal rotary shaft which is a cathode electrode on an upper part of plating bath and a rotary shaft in the plating bath. CONSTITUTION:The cylindrical mesh for the rotary screen is inserted between the horizontal rotary shaft 4 above the Ni plating bath 5 and the weight roll 19 made of a material not to be applied with plating in the plating solution. Electroplating is executed by energizing between the chip housing 12-14 as an anode electrode and the horizontal rotary shaft 4 as a cathode electrode. Since the mesh R is securely winded on the horizontal rotary shaft 4 by gravity of the weight roll 19, the whole surface of the mesh R is uniformly plated with sufficient transmission of plating current by rotation of the horizontal rotary shaft 4.