AGENT FOR FORMING FINE PATTERN OF FERROELECTRIC THIN FILM AND METHOD FOR FORMING THE SAME

PURPOSE:To prepare the subject agent which enables a fine resistless patterning of a ferroelectric thin film by incorporating a sensitive polymer obtd. by the condensation of a specific polymer with a specific compd. into the agent. CONSTITUTION:A sensitive polymer obtd. by the condensation of a pol...

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1. Verfasser:	KANZAWA AKIRA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PURPOSE:To prepare the subject agent which enables a fine resistless patterning of a ferroelectric thin film by incorporating a sensitive polymer obtd. by the condensation of a specific polymer with a specific compd. into the agent. CONSTITUTION:A sensitive polymer obtd. by the condensation of a polymer of the formula (wherein M is a metal atom such as Pb, Zr, Ti, or Ba; R1 is a group such as CH3 or C2H5 provided that it may be absent depending on the valency of M; and R2 is an alkyl group contg. a heteroatom) with a compd. having a functional group which responds to an electromagnetic wave or corpusclar ray to cause the cross-linking between the polymers (e.g. acryloyl chloride) is incorporated into the objective agent.