MATERIAL AND METHOD FOR FORMING FINE PATTERN OF FERROELECTRIC THIN FILM

PURPOSE:To prepare the subject material which enables a fine resistless patterning of a ferroelectric thin film by mixing a colloidal soln. contg. a specific polymer with a specific sensitive compd. CONSTITUTION:A colloidal soln. contg. a polymer of formula I (wherein R1 is a group such as CH3 or C2...

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Bibliographische Detailangaben
1. Verfasser:	KANZAWA AKIRA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CABLES CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON CONDUCTORS ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INSULATORS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Zusammenfassung:	PURPOSE:To prepare the subject material which enables a fine resistless patterning of a ferroelectric thin film by mixing a colloidal soln. contg. a specific polymer with a specific sensitive compd. CONSTITUTION:A colloidal soln. contg. a polymer of formula I (wherein R1 is a group such as CH3 or C2H5; R2 is a group such as CH=CH2; R3 is a group such as phenyl; and M is a metal atom such as Pb, Zr, Ti, La, or Ba) is mixed with a sensitive compd., which responds to an electromagnetic wave or corpuscular ray to cause the cross-linking between the polymers (e.g. a compd. of formula II).