METHOD FOR PRODUCING ARTIFICIAL GRID FILM

PURPOSE:To enable an artificial grid film with a sharp interface of a lamination film, a high orientation property of a crystal orientation, and a vertical magnetization by using the ion beam sputter method and specifying acceleration energy of the ion in the artificial grid layer where a specific m...

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Hauptverfasser: OKUNO SHIHO, YUSU KEIICHIROU, HASHIMOTO SUSUMU, INOMATA KOICHIRO
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creator OKUNO SHIHO
YUSU KEIICHIROU
HASHIMOTO SUSUMU
INOMATA KOICHIRO
description PURPOSE:To enable an artificial grid film with a sharp interface of a lamination film, a high orientation property of a crystal orientation, and a vertical magnetization by using the ion beam sputter method and specifying acceleration energy of the ion in the artificial grid layer where a specific magnetic metal layer and a non-magnetic layer consisting of a non-magnetic transition metal are alternately laminated. CONSTITUTION:In an artificial grid film where a magnetic metal layer consisting of Co1-xFex (0
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH0462814A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH0462814A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH0462814A3</originalsourceid><addsrcrecordid>eNrjZND0dQ3x8HdRcPMPUggI8ncJdfb0c1dwDArxdPN09nT0UXAP8gTKevr48jCwpiXmFKfyQmluBgU31xBnD93Ugvz41OKCxOTUvNSSeK8ADwMTMyMLQxNHYyKUAADaeiP7</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD FOR PRODUCING ARTIFICIAL GRID FILM</title><source>esp@cenet</source><creator>OKUNO SHIHO ; YUSU KEIICHIROU ; HASHIMOTO SUSUMU ; INOMATA KOICHIRO</creator><creatorcontrib>OKUNO SHIHO ; YUSU KEIICHIROU ; HASHIMOTO SUSUMU ; INOMATA KOICHIRO</creatorcontrib><description>PURPOSE:To enable an artificial grid film with a sharp interface of a lamination film, a high orientation property of a crystal orientation, and a vertical magnetization by using the ion beam sputter method and specifying acceleration energy of the ion in the artificial grid layer where a specific magnetic metal layer and a non-magnetic layer consisting of a non-magnetic transition metal are alternately laminated. CONSTITUTION:In an artificial grid film where a magnetic metal layer consisting of Co1-xFex (0&lt;x&lt;1) and a non-magnetic metal layer of precious metals Pt, Pd, Ru, Au, and Ag or at least one type of Al and Cu are laminated alternately, the ion beam sputtering is used as a manufacturing method and an acceleration energy of ion is 600 eV or less. Ions which are generated by an ion gun (1) are accelerated and are radiated to a target, sputter atoms constituting the target, and the sputtered atoms are deposited on a substrate(S). The target is rotated alternately to enable a lamination film to be produced. An ion gun (2) is used to emit ions during cleaning or formation of film of the substrate.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRICITY ; INDUCTANCES ; INFORMATION STORAGE ; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; MAGNETS ; METALLURGY ; PHYSICS ; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TRANSFORMERS</subject><creationdate>1992</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19920227&amp;DB=EPODOC&amp;CC=JP&amp;NR=H0462814A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19920227&amp;DB=EPODOC&amp;CC=JP&amp;NR=H0462814A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OKUNO SHIHO</creatorcontrib><creatorcontrib>YUSU KEIICHIROU</creatorcontrib><creatorcontrib>HASHIMOTO SUSUMU</creatorcontrib><creatorcontrib>INOMATA KOICHIRO</creatorcontrib><title>METHOD FOR PRODUCING ARTIFICIAL GRID FILM</title><description>PURPOSE:To enable an artificial grid film with a sharp interface of a lamination film, a high orientation property of a crystal orientation, and a vertical magnetization by using the ion beam sputter method and specifying acceleration energy of the ion in the artificial grid layer where a specific magnetic metal layer and a non-magnetic layer consisting of a non-magnetic transition metal are alternately laminated. CONSTITUTION:In an artificial grid film where a magnetic metal layer consisting of Co1-xFex (0&lt;x&lt;1) and a non-magnetic metal layer of precious metals Pt, Pd, Ru, Au, and Ag or at least one type of Al and Cu are laminated alternately, the ion beam sputtering is used as a manufacturing method and an acceleration energy of ion is 600 eV or less. Ions which are generated by an ion gun (1) are accelerated and are radiated to a target, sputter atoms constituting the target, and the sputtered atoms are deposited on a substrate(S). The target is rotated alternately to enable a lamination film to be produced. An ion gun (2) is used to emit ions during cleaning or formation of film of the substrate.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRICITY</subject><subject>INDUCTANCES</subject><subject>INFORMATION STORAGE</subject><subject>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>MAGNETS</subject><subject>METALLURGY</subject><subject>PHYSICS</subject><subject>SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TRANSFORMERS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1992</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZND0dQ3x8HdRcPMPUggI8ncJdfb0c1dwDArxdPN09nT0UXAP8gTKevr48jCwpiXmFKfyQmluBgU31xBnD93Ugvz41OKCxOTUvNSSeK8ADwMTMyMLQxNHYyKUAADaeiP7</recordid><startdate>19920227</startdate><enddate>19920227</enddate><creator>OKUNO SHIHO</creator><creator>YUSU KEIICHIROU</creator><creator>HASHIMOTO SUSUMU</creator><creator>INOMATA KOICHIRO</creator><scope>EVB</scope></search><sort><creationdate>19920227</creationdate><title>METHOD FOR PRODUCING ARTIFICIAL GRID FILM</title><author>OKUNO SHIHO ; YUSU KEIICHIROU ; HASHIMOTO SUSUMU ; INOMATA KOICHIRO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH0462814A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1992</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRICITY</topic><topic>INDUCTANCES</topic><topic>INFORMATION STORAGE</topic><topic>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>MAGNETS</topic><topic>METALLURGY</topic><topic>PHYSICS</topic><topic>SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TRANSFORMERS</topic><toplevel>online_resources</toplevel><creatorcontrib>OKUNO SHIHO</creatorcontrib><creatorcontrib>YUSU KEIICHIROU</creatorcontrib><creatorcontrib>HASHIMOTO SUSUMU</creatorcontrib><creatorcontrib>INOMATA KOICHIRO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OKUNO SHIHO</au><au>YUSU KEIICHIROU</au><au>HASHIMOTO SUSUMU</au><au>INOMATA KOICHIRO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD FOR PRODUCING ARTIFICIAL GRID FILM</title><date>1992-02-27</date><risdate>1992</risdate><abstract>PURPOSE:To enable an artificial grid film with a sharp interface of a lamination film, a high orientation property of a crystal orientation, and a vertical magnetization by using the ion beam sputter method and specifying acceleration energy of the ion in the artificial grid layer where a specific magnetic metal layer and a non-magnetic layer consisting of a non-magnetic transition metal are alternately laminated. CONSTITUTION:In an artificial grid film where a magnetic metal layer consisting of Co1-xFex (0&lt;x&lt;1) and a non-magnetic metal layer of precious metals Pt, Pd, Ru, Au, and Ag or at least one type of Al and Cu are laminated alternately, the ion beam sputtering is used as a manufacturing method and an acceleration energy of ion is 600 eV or less. Ions which are generated by an ion gun (1) are accelerated and are radiated to a target, sputter atoms constituting the target, and the sputtered atoms are deposited on a substrate(S). The target is rotated alternately to enable a lamination film to be produced. An ion gun (2) is used to emit ions during cleaning or formation of film of the substrate.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRICITY
INDUCTANCES
INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
MAGNETS
METALLURGY
PHYSICS
SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
TRANSFORMERS
title METHOD FOR PRODUCING ARTIFICIAL GRID FILM
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-09T18%3A02%3A15IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=OKUNO%20SHIHO&rft.date=1992-02-27&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPH0462814A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true