METHOD FOR PRODUCING ARTIFICIAL GRID FILM

PURPOSE:To enable an artificial grid film with a sharp interface of a lamination film, a high orientation property of a crystal orientation, and a vertical magnetization by using the ion beam sputter method and specifying acceleration energy of the ion in the artificial grid layer where a specific m...

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Hauptverfasser:	OKUNO SHIHO, YUSU KEIICHIROU, HASHIMOTO SUSUMU, INOMATA KOICHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INDUCTANCES INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MAGNETS METALLURGY PHYSICS SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSFORMERS
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Beschreibung
Zusammenfassung:	PURPOSE:To enable an artificial grid film with a sharp interface of a lamination film, a high orientation property of a crystal orientation, and a vertical magnetization by using the ion beam sputter method and specifying acceleration energy of the ion in the artificial grid layer where a specific magnetic metal layer and a non-magnetic layer consisting of a non-magnetic transition metal are alternately laminated. CONSTITUTION:In an artificial grid film where a magnetic metal layer consisting of Co1-xFex (0