METHOD OF AFTERTREATING HYDROGEN PEROXIDE FOR USE IN SEMICONDUCTOR TECHNIQUE CONTAINING INORGANIC AND/OR ORGANIC CONTAMINANT ONLY TRIVIAL AMOUNT OF WHICH IS DISSOLVED

A process is described for the purification of hydrogen peroxide for use in microelectronics. For this purpose, after adding small quantities of chelating agents, hydrogen peroxide starting solutions prepurified by distillation are brought into contact with non-ion-exchanging polymeric adsorbents ba...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	HERUMUUTO HOONITSUHI, JIIKUFURIITO GAIGERU
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY COMPOUNDS THEREOF INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION THEIR RELEVANT APPARATUS TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A process is described for the purification of hydrogen peroxide for use in microelectronics. For this purpose, after adding small quantities of chelating agents, hydrogen peroxide starting solutions prepurified by distillation are brought into contact with non-ion-exchanging polymeric adsorbents based on styrene divinylbenzene copolymers. This produces high-purity hydrogen peroxide solutions which meet the high purity requirements for use in the production of 4- and 16-megabit chips.