BLACK MATRIX AND PRODUCTION THEREOF

PURPOSE:To provide an excellent light shielding characteristic and large electric resistance with a sufficiently thin layer and to allow the easy production of the black matrix by constituting the black matrix of a layer essentially consisting of preseodymium dioxide. CONSTITUTION:The black matrix i...

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Bibliographische Detailangaben
Hauptverfasser: MITAMURA SADAO, KUMAKAWA KATSUHIKO, MUNENO RYUICHI, YAMAZOE HIROSHI
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To provide an excellent light shielding characteristic and large electric resistance with a sufficiently thin layer and to allow the easy production of the black matrix by constituting the black matrix of a layer essentially consisting of preseodymium dioxide. CONSTITUTION:The black matrix is constituted of the mixed crystal layer formed by adding manganese dioxide to the preseodymium dioxide. A resist layer of desired patterns is formed on a substrate having a conductive layer on a main surface and the exposed conductive layer is removed, then the layer essentially consisting of the preseodymium dioxide is formed over the entire main surface and the resist layer is removed in such a case. The black matrix is constituted of the sufficiently thin layer in this way. The transmittance of light is lowered and the electric resistance is increased if the black matrix is constituted of the mixed crystals added with the manganese dioxide.