ECR PLASMA TREATING DEVICE

PURPOSE:To form a diffused magnetic field capable of uniformizing the infrasurface distribution of the speed to treat the surface of a substrate in the ECR plasma treating device in which ECR plasma is produced by the interaction between the magnetic field and microwave in the cylindrical microwave resonator, and the plasma is introduced into the adjacent reaction chamber from the plasma drawing port in the end face of the resonator by the diffused magnetic field to apply CVD, etc., to the surface of the substrate in the reaction chamber. CONSTITUTION:A diffused magnetic field is formed by the cylindrical solenoid 6 arranged coaxially with a cylindrical microwave resonator 5, the length of the solenoid 6 is controlled to 0.8 times its inner diameter to reduce the axial thickness of the ECR resonance magnetic flux density region, hence the effect of the radial thickness distribution of the region on the radial distribution of the plasma density is reduced at the substrate position, and the end of the solenoid where the radial distribution of the magnetic flux density is uniformized or an external magnetic field is utilized for the treatment.