BICRYSTAL SUBSTRATE

PURPOSE:To improve reproducibility and stability of characteristics at low noise by providing a second phase on the surface of a bicrystal substrate consisting of at least two or more Si single crystals. CONSTITUTION:Using two single crystal blocks 1 and 2 as substrate material, a surface (001) is f...

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Bibliographische Detailangaben
Hauptverfasser:	SUZUKI HAJIME, MUTO MUTSUHARU, YAMASHITA TSUTOMU, OSAKA YUKIO, MIYOUREN HIROAKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To improve reproducibility and stability of characteristics at low noise by providing a second phase on the surface of a bicrystal substrate consisting of at least two or more Si single crystals. CONSTITUTION:Using two single crystal blocks 1 and 2 as substrate material, a surface (001) is formed in parallel with the surface of paper. Square blocks are cut so that the axes (100) and (010) on the above-mentioned plane rotate at an angle of 24 deg. on the blocks 1 and 2, and the junction surface 3 of each block is flatly mirror-polished. Using a pyrania solution and cleaning fluid of acetone and ethyl alcohol, the blocks are connected in a hot-press furnace. Then, pressure is removed, the furnace is cooled down, and a bicrystal block is manufactured. This bicrystal block is cut into the prescribed shape, substrate surface is mirror-polished, and an Si bicrystal substrate is obtained.