CAVITY MEASURING METHOD AND APPARATUS

PURPOSE:To enable the measurement of an optical path length and an effective reflection factor of a cavity to be conducted even when they are severable mm and below 1% respectively. CONSTITUTION:Current having a DC bias current Iop overlapping a modulation current In is supplied to a semiconductor l...

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Bibliographische Detailangaben
1. Verfasser:	YONETANI HARUO
Format:	Patent
Sprache:	eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	PURPOSE:To enable the measurement of an optical path length and an effective reflection factor of a cavity to be conducted even when they are severable mm and below 1% respectively. CONSTITUTION:Current having a DC bias current Iop overlapping a modulation current In is supplied to a semiconductor laser 2 and a radiation light thereof is detected with a photo detector 3 to measure a harmonic distortion rate D of an output signal of the photo detector 3. A temperature change T corresponding to the cycle of the distortion rate D is measured by varying the temperature T of the semiconductor laser 2 to determine a wavelength change lambdaof a laser light corresponding to the temperature change T. Thus, an optical path length L and an effective reflection factor R of a cavity 10 arranged in an optical path of the laser light are calculated based on the distortion rate D and the wavelength change lambda.