JPH04249830

PURPOSE:To correct a normal pattern easily, and furthermore, automate the correcting work by eliminating the whole of a pattern part, where correction of pattern is required, and forming a new normal pattern. CONSTITUTION:A failure dot 5a of a pattern 3 drawn on a shadow mask original plate 2 is detected, and at each time of detecting a failure dot 5a, a position of the failure dot 5a is stored as a X-Y coordinate data. In the case that a failure dot 5a is detected, it is stored and the whole of the failure dot 5a of the X-Y coordinate data is eliminated. Next, photoresist is coated for formation at a normal position of a part where the failure dot 5a is eliminated. Next, a dot pattern is exposed at a normal position on the photoresist. The photoresist except for that of an exposed part is eliminated to form a normal-shape dot 5a in at a normal position.